Semiconductor Vacuums

V-1000 Vacuum Ultraviolet Spectrophotometer

Miniaturization of wafer manufacturing processes has promoted the shift towards shorter photolithography wavelengths. Currently, ArF lasers (193 nm) are most currently used. Research on the practical implementation of F2 (157 nm) has reduced the imprinting node to 0.07 µm.

The V-1000 was designed to evaluate optical properties in the wavelength range between 115 and 300 nm. Typically, instrument optical paths for analyses in this range are evacuated due to the strong absorption of oxygen, thus, the ‘vacuum’ ultraviolet range. The V-1000 provides rapid sample measurements without evacuation of the entire instrument by using a nitrogen purge and dual sample exchange cabinets to enhance purge efficiency. Superior photometric reproducibility is achieved by using a double monochromator for elimination of stray light and a reference stabilized double-beam system to maintain baseline stability.

System Features

• Highly accurate measurements in the vacuum UV range
  Double monochromator and reference stabilized double-beam system achieves a photometric reproducibility of  0.03%.
• Rapid switchover between transmission/reflection measurement
  Samples are easily loaded for either reflection measurements at 5° or 45° or transmission   measurements without replacing sampling accessories. Please contact us if you require a special configuration.
• Quick measurements
  By increasing purge efficiency and eliminating dead space in the optical path, measurements are completed within minutes.

BRV-100 Vacuum Ultraviolet Birefringence Meter

CaF2 is the most suitable material to be used for lenses in 157 nm optical lithography applications. However, CaF2 is an anisotropic material subject to birefringence, distorting the focal point of the laser light used in optical lithography. Although the birefringence errors can be corrected, the CaF2 lenses and optical systems require accurate characterization to ensure a proper focal point of the illuminating laser. Characterization of the CaF2 birefringence requires a metrological measurement with extremely high accuracy. Based on years of experience in polarization measurements, the BRV-100 was developed by JASCO to measure the birefringence of optical materials. A highly sensitive birefringence instrument using a PEM (photoelastic modulator) for polarization modulation, the transmission wavelength is extended to the vacuum ultraviolet region by purging the optical path with nitrogen to reduce absorption by oxygen and water vapor.

System Features

• High sensitivity
  The phase difference angle is calculated from an arc-sine function providing a highly sensitive measurement of birefringence below 1 nm/cm. The birefringence   (F-signal) is calculated as f = -sin (D), with accurate detection of signals around zero.
• High stability
  The LiF PEM is controlled by an optical servo loop, providing measurements with highly stable ordinate values. A reference beam monitors the retardation amplitude of the PEM to observe an achromatic modulation even in the vacuum ultraviolet region. The optical servo provides a stable measurement of below 0.1% in the purged instrument environment.

FLV-1000 Vacuum-Ultraviolet Spectrofluorometer

The plasma display panel (PDP) is expected to dominate the flat panel display market due to an improved viewing angle, faster update speeds, and a crisper picture quality. Gas discharge excitation of RGB photoluminescent phosphors is used by the plasma display panels to produce the displayed picture. However, there is still a need for improvement in display performance; the high power requirements and relatively high cost of manufacture restricting the viability of the PDP compared to other display alternatives. The JASCO FLV-1000 VUV Spectrofluorometer can be used for the development and characterization of new PDP phosphors or the inspection and control of PDP manufacturing processes.

System Features

• Zero dispersion double monochromator for low stray light and high-throughput
• Dual-beam optical system using sodium salicylate as a reference monitor for excellent repeatability
• Stand-alone system includes a nitrogen purge system
• Automated cell changer for up to three samples
• Filter program for optimum fluorescence wavelengths
• Optional transmittance mode measurements

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