Request Quote

or Call (800) 333 - 5272

M-550 Ellipsometer

JASCO’s ellipsometer employs a proprietary polarization modulation technique (a PEM dual lock-in system) utilizing a photoelastic modulator, instead of the rotational drive mechanism of conventional ellipsometers.

M-550 Ellipsometer

System Description

Ellipsometry is a method for determining the refractive index and extinction coefficients of a sample by measuring the change in polarization state of surface reflected light. Film thickness and optical constants of an adsorption layer or oxide film on a substrate surface can be determined with exceptional sensitivity.

Conventional interference spectroscopy utilizes light passed through separate optical paths, while ellipsometry is a form of interferometry that uses two vibrational components with the same optical path, providing measurements with excellent accuracy and sensitivity.


The PEM dual lock-in system of JASCO's ellipsometer provides a stable measurement with additional capabilities including high-speed data sampling and wavelength scanning.

System Features

Automated wavelength scanning

The PEM dual lock-in system (JP Pat. # 2064627) automatically controls the PEM drive voltage for the current wavelength with an optical servo (JP Pat. #2081599) to increase ordinate accuracy during high speed scanning.

High-speed data sampling

Using high-speed electrical modulation, the PEM dual lock-in system enables high-speed data sampling in as little as 1 millisecond (optional 20 microseconds), far faster than systems that mechanically rotate a polarizer/analyzer combination.

High stability and reliability

The PEM dual lock-in system offers a static measurement free from mechanical error with high stability by using the optical servo and an optical reference.

Highly sensitive thin film analysis

The PEM dual lock-in system employs a proprietary polarizing configuration offering maximum sensitivity for extremely thin dielectric and semiconductor films.

Related Instruments

Absolute Reflectance

Absolute Reflectance The absolute reflectance measurement system automates the measurement of the spectral properties, film thickness, angle variation or other characteristics of...

Film Thickness

Film Thickness The thickness of the epitaxial layer, substrate, etching (residual layer), liquid crystal cell gap, and other semiconductor layers dramatically impacts...

Fluorescence Detector

Fluorescence Detector JASCO's Confocal fluorescence detector can be used to determine the depth of the fluorescent contaminant without destroying the crucible.


Microspectrophotometer The MSV-5000 microscope system incorporates a double-beam scanning spectrophotometer for optimum measurements in the UV-Vis to NIR region (200-2700 nm).

Near Field Scanning

Near Field Scanning The NFS Series of scanning near-field optical microspectrometers have been optimized as a new solution for nanotechnology applications.

Quantum Efficiency

Quantum Efficiency A quantum efficiency measurement system for solid samples integrates the spectrofluorometer with an integrating sphere for fluorescence emission and a...

Raman Spectrometers

Raman Spectrometers The NRS Series of bench top are based on JASCO’s proven technology emphasizing sensitivity, reliability, and ease of operation...

Supercritical Fluid

Supercritical Fluid Perfluoropolyether (PFPE) is a lubricant widely used in many aerospace, vacuum, electronic and semiconductor applications due to its excellent chemical...


Vacuums The V-1000 was designed to evaluate optical properties in the wavelength range between 115 and 300 nm.

Download Catalog

Download Catalog

Get more information
by downloading our latest catalog


Application Notes Library

Application Notes Library

Check out JASCO's application notes for a wide range of industries.

View All

Training for UV-VIS-NIR

Training for UV-VIS-NIR

November 7, 2016

Learn More