The thickness of the epitaxial layer, substrate, etching (residual layer), liquid crystal cell gap, and other semiconductor layers dramatically impacts semiconductor device performance.
Ellipsometry is a method for determining the refractive index and extinction coefficients of a sample by measuring the change in polarization state of surface reflected light.
The MSV-5000 microscope system incorporates a double-beam scanning spectrophotometer for optimum measurements in the UV-Vis to NIR region (200-2700 nm).
The NRS Series of bench top are based on JASCO’s proven technology emphasizing sensitivity, reliability, and ease of operation from a PC-controlled optical system.
The NFS Series of scanning near-field optical microspectrometers have been optimized as a new solution for nanotechnology applications.
The V-1000 was designed to evaluate optical properties in the wavelength range between 115 and 300 nm.
A quantum efficiency measurement system for solid samples integrates the spectrofluorometer with an integrating sphere for fluorescence emission and a quantum efficiency calculation program.
The absolute reflectance measurement system automates the measurement of the spectral properties, film thickness, angle variation or other characteristics of solid samples.
JASCO's Confocal fluorescence detector can be used to determine the depth of the fluorescent contaminant without destroying the crucible.
Perfluoropolyether (PFPE) is a lubricant widely used in many aerospace, vacuum, electronic and semiconductor applications due to its excellent chemical and tribological properties.